Presentation Information
[22a-21C-6]Investigation of (0001) surface ITO etching with plasma emission monitoring in GaInN/GaN multiple-quantum-shell LEDs
〇Yuta Hattori1, Satoshi Kamiyama1, Tetsuya Takeuchi1, Motoaki Iwaya1, Soma Inaba1, Ayaka Shima1, shiori Ii1, Mizuki Takahashi1, Yuki Yamanaka1, Kosei Kubota1 (1.Meijo Univ.)
Keywords:
nanowire
MQS-LEDs with multiple quantum shell (MQS) active layers grown on GaN nanowires (NWs) are composed of polar (0001), non-polar (10-10) and semi-polar (1-101) planes. Conventional MQS-LEDs have low luminescence efficiency when driven by low current domains because current injection starts from the (0001) surface, which has a large defect density. In this study, we investigated the effect of selective and precise etching of ITO on the top of the (0001) surface by using a plasma luminescence monitor to block the current to the (0001) surface.