[22p-12K-1~14] 10.1 Emerging materials in spintronics and magnetics (including fabrication and characterization methodologies)

5:15 PM - 5:30 PM JST(8:15 AM - 8:30 AM UTC)

[22p-12K-14] Optimization of reactive ion etching conditions for micro-fabrication with low damage in BiFeO₃-based multiferroic thin films

Ratha Soumyaranjan¹, Genta Egawa¹, 〇Satoru Yoshimura¹ (1.Akita Univ.)

Keywords:

Multiferroic thin films,Magnetic properties,Reactive ion etching

One of the considerations for the future application of magnetic devices in BiFeO₃-based multiferroic thin films is the establishment of a method for micro-fabrication with minimal damage. In this study, we investigated the structual and magnetical damage effects of reactive ion etching conditions on BiFeO₃-based thin films.