Presentation Information
[22p-P03-15]Perovskite precursor solution amount with a spin coating method using a patterning mask
〇(D)Nao Saito1, Tomoyuki Tobe1,3, Naoyuki Shibayama2, Masashi Ikegami1, Tsutomu Miyasaka2 (1.Graduate School of Engineering, Toin Univ.Yokohama, 2.Faculty of Biomedical Engineering, Toin Univ.Yokohama, 3.KISTEC)
Keywords:
Perovskite solar cells,Patterning,spin coating
Perovskite solar cells have been attracting attention since they can be fabricated using coating methods. However, there are still challenges in uniformly coating the perovskite layer onto practical sizes. Improvements in the coating method of perovskite layers are necessary, including reducing the amount of perovskite precursor solution.We attached a PET film with a special silicone adsorption layer with rectangular holes as a patterning mask to an ITO-PET substrate. By UV-Ozone treatment the mask film-attached substrates, a significant difference in surface wettability was observed between the exposed and unexposed surfaces of ITO. When using substrates of 9.5cm × 7cm and UV-ozone treatment was performed using a mask film with an exposed area of (0.7 × 6 cm2) × 6 = 25.2 cm2 and then the film was peeled off and coated, the amount of precursor solution was reduced by 25% compared to the case without using a mask, and the perovskite layer was also formed in the shape of the mask.