[23a-1BJ-1~10] 3.14 Silicon photonics and integrated photonics (formerly 3.15)

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[23a-1BJ-8] Fabrication of Si Photonics Efficient Grating Coupler with 150 nm Feature Size

〇Naoki Tahara¹, Rikuto Taira¹, Yuriko Maegami², Tai Tsuchizawa², Noritsugu Yamamoto², Koji Yamada², Toshihiko Baba¹ (1.Yokohama Nat'l Univ., 2.AIST)

Keywords:

Silicon photonics

A grating coupler with high efficient coupling between on-chip waveguides and external optical fiber was designed and fabricated. The designed grating coupler has an easy to fabricate structure which consists of half-etched grating and perforated holes. The maximum coupling efficiency was calculated to be 83.7%. The grating coupler was fabricated with 300 mm wafer, ArF immersion exposure and a two-step etching process. We were able to fabricate an almost ideal structure. The 1/e² spot diameter and the beam divergence of the upward emitted light were 10 mm × 12 mm, 8.3°×7.2°respectively, which approximately matched the diameter of the fiber mode to be coupled.