Presentation Information

[23a-22A-4]Formation of CaSi2 layers on high-resistivity Si(111) substrates and their low-temperature thermoelectric properties

〇Kagiri Kato1, Shigehisa Shibayama1, Mitsuo Sakashita1, Osamu Nakatsuka1,2, Takayoshi Katase3, Masashi Kurosawa1 (1.Grad. Sch. of Eng., Nagoya Univ., 2.IMaSS, Nagoya Univ., 3.MDX ES, Tokyo Tech.)

Keywords:

low-temperature thermoelectric properties,2D materials