Presentation Information
[23a-P08-9]Photoresist removal using highly concentrated ozone water 2
〇Toshinori Miura1, Naoki Kato1, Akitoshi Nakagawa1, Satoru Seike1 (1.Meidensha Corp.)
Keywords:
semiconductor,ozone water,photoresist
Ozonated water is being studied as an alternative to harmful chemicals such as sulfuric acid and hydrogen peroxide that are widely used in the cleaning process of semiconductor manufacturing. We are developing an ultra-high concentration ozone water generator exceeding 400ppm using about 100% concentration and high purity ozone gas (pure ozone gas) obtained from Meidensha Pure Ozone Generator (POG). This time, in order to investigate the effect of photoresist removal, we report that the obtained ozone water was applied to the removal of the photoresist used in the semiconductor lithography process.