Presentation Information
[23p-12D-12]Enhancement of anomalous Nernst effect in annealed-CoGe thin films
〇(M2)Takuya Tsujimoto1, Takeshi Fujita2, Shigenori Ueda3, Toshio Miyamachi1, Masaki Mizuguchi1 (1.Nagoya Univ., 2.Kochi Univ. Tech., 3.NIMS)
Keywords:
spintronics,spin caloritronics,the Anomalous Nernst effect
We investigated the anomalous Nernst effect in CoGe thin films and effect of post-annealing for ANE was investigated. CoGe thin films were fabricated by the co-sputtering method on MgO substrates at room temperature. Post-annealing was performed at temperatures ranging from 473 to 1073 K. Crystallographic structures were characterized by a transmission electron microscope (TEM). The Nernst voltage was measured by a physical property measurement system (PPMS). It was confirmed that as deposited CoGe thin films possessed columnar structures and the samples annealed at 573 - 773 K possessed island ordered phase of Co2Ge by cross-sectional TEM images. Sxy increased in the latter series and reached up to 1.2 µV/K, which substantiates the effect of post-annealing for ANE. To investigate the mechanism of the enhancement of the ANE, we conducted hard x-ray photoelectron spectroscopy (HAXPES) and studied electronic structures of each sample.