Presentation Information

[23p-12L-7]Deposition of In2S3 Thin Films via Mist-CVD Method

〇Yohei Araki1, Akihiro Funaki1, Fumiya Furumaki1, Takahito Nishimura1, Akira Yamada1 (1.Tokyo Tech.)

Keywords:

mist-CVD,n-type buffer layer

In2S3 thin film was deposited by mist-CVD method as an alternative material for n-type CdS buffer layer, which is important for improving the efficiency of Cu(In,Ga)Se2 solar cells. The deposition was conducted in a glove box filled with nitrogen to avoid oxygen contamination. From XRD measurements and SEM observations, it was confirmed that In2S3 was deposited uniformly on the non-alkaline glass substrate using the mist-CVD method.