Presentation Information

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[23p-1BN-5]DNA Thin Films Fabricated via Laser Molecular Beam Deposition: Characterization of electrical conduction properties

〇Hakurin Liu¹, Sui Liu¹, Shohei Ishikawa¹, Tekkou Kou¹, Tomohiro Murata², Xuechen Shen², Kosuke Minami³, Tomohiko Yamazaki³, Tomomasa Sato¹, Katsuhiko Ariga^3,2, Nobuyuki Matsuki¹ (1.Kanagawa Univ., 2.The Univ. of Tokyo, 3.NIMS)

Keywords:

DNA,Laser deposition,Thin-film functional materials

The resistivity of intrinsic deoxyribonucleic acid (DNA) is 10⁸ ~10⁹ Ω·cm, which is almost insulator-like and has semiconducting carrier transport properties, and is known to change significantly depending on water adsorption, the content ratio of Guanine (G)-Cytosine (C) pairs and Adenine (A)-Thymine (T) pairs, and intercalation of metal ions, therefore, it is expected to be applied as a molecular electronics materials. We are aiming to realize novel device applications of DNA thin films by using laser molecular beam deposition (LMBD) method, which enables hybrid molecular layer deposition for a wide range of inorganic and organic materials (T. Murata et al., Bull. Chem. Soc. Jpn. Jpn., 96, 29 (2022)). In this study, we evaluate the electrical conductivity properties of DNA thin films formed by LMBD.

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