[23p-22A-1~8] 15.5 Group IV crystals and alloys

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[23p-22A-6] Liquid phase growth mechanism of SiGe films using printing and firing

〇(M1)Kohei Ito¹, Satoru MIyamoto¹, Shota Suzuki², Hideaki Minamiyama², Marwan Dhamrin^2,3, Noritaka Usami^1,4,5 (1.Grad.Eng., Nagoya Univ., 2.Toyo Aluminium K.K., 3.Osaka Univ., 4.InFuS, Nagoya Univ., 5.IMaSS, Nagoya Univ.)

Keywords:

silicon-germanium,epitaxial growth,liquid phase growth