[24p-12B-1~15] CS.1 Code-sharing Session of 2.3 & 7.4

4:45 PM - 5:00 PM JST(7:45 AM - 8:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[24p-12B-12] Substrate cooling dependence of etching using reactive gas adsorption and GCIB

〇(BC)Taichi Ito¹, Kohdai Sakuta¹, Masaya Takeuchi¹, Noriaki Toyoda¹ (1.University of Hyogo)

Keywords:

gas cluster ion beam,etching,cooling