[24p-12H-1~17] 6.4 Thin films and New materials

3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[24p-12H-9] Highly flexible thin-film capacitor fabricated with PCSD

〇Masayuki Fukuda¹, Yuuki Kitanaka¹, Iwao Yamaguchi¹, Junichi Nomoto¹, Tomohiko Nakajima¹ (1.AIST)

Keywords:

flexible thin-film,dielectric

Recently, there is an increasing demand for thin-film dielectric capacitors that can be integrated into circuit board interiors and onto curved surfaces, owing to the miniaturization and complex design requirements of electronic devices. In this study, we successfully fabricated highly flexible thin-film capacitors with low cracks and dielectric loss by precisely controlling the deposition conditions in the PCSD (Photo-assisted Chemical Solution Deposition) method, which involves low-temperature crystalline growth through ultraviolet light exposure. We will present a detailed report on the dielectric and mechanical properties of the capacitors obtained in this process.