[24p-21B-1~12] 22.1 Joint Session M "Phonon Engineering"

1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[24p-21B-4] Impact of Transition Layer on the Thermal Resistance at Hetero-interfaces of Amorphous Oxides: A Molecular Dynamics Study

〇Rukuto Watanabe¹, Takanobu Watanabe¹, Yusuke Nisimura¹ (1.Waseda Univ.)

Keywords:

semiconductor,thermal resistance,interface