[24p-61C-1~7] Progress in deep ultraviolet light devices

1:35 PM - 2:05 PM JST(4:35 AM - 5:05 AM UTC)

[24p-61C-3] Development of 220-nm-band Far-UV Light Sources using Wavelength Conversion

〇Ryuji Katayama¹, Hideto Miyake², Masashi Yoshimura³, Masahiro Uemukai¹, Tomoyuki Tanikawa¹ (1.Grad. Sch. of Eng., Osaka Univ., 2.Grad. Sch. of Eng., Mie Univ., 3.Inst. of Laser Eng., Osaka Univ.)

Keywords:

second harmonic generation,far ultraviolet light source

Far-ultraviolet light in the 220 nm wavelength band is suitable as a disinfection light that can be irradiated to the human body. As an inexpensive and efficient light source that can replace excimer lamps or lasers, we have developed a second harmonic generation device that can use a high-efficiency InGaN laser as a fundamental light source. We report on the successful far-ultraviolet light generation demonstrated using two novel wavelength conversion devices: an AlN thin film waveguide with a crystallographic orientation inversion and a SrB4O7 microcavity with a strict reflection phase control and strong optical confinement.