Presentation Information
[25a-12F-8]Laser Damage Resistamce of Low Refractive Index SiO2 Optical Thim Films
〇(M2)Takara Asai1, Hiroshi Murotani1 (1.Tokai Univ.)
Keywords:
optical thim films,silicon dioxide
It is said that for high-power lasers, low-density films have a higher laser-induced damage threshold when AR coating is used, while high-density films have a higher threshold when mirror coating is used, but this has not been verified due to the difficulty of producing films of the same material but different densities. In recent years, laser damage at low power and long duration, such as in laser projectors, has also become a problem. Our laboratory's combination deposition system can perform continuous or simultaneous deposition by electron beam deposition and sputtering. In the combination deposition method, the refractive index (packing density) of Si02 optical thin films can be controlled by previous studies. In this report, Si02 optical thin films were prepared using the combination deposition method, and the laser resistance to the change in packing density of the films was evaluated.