Presentation Information
[25a-P01-47]Expanding the light modulation area of magnetic nanowire light modulators by optimizing the notch structure and hard magnets
〇(B)Reimi Konishi1, Kenichi Aoshima2, Mayumi Kawana2, Ryo Higashida2, Kenji Machida2, Yasunobu Akiyama1, Nobuhiko Funabashi2 (1.Tokai Univ., 2.NHK STRL.)
Keywords:
MO-SLM,holography,Current-induced magnetic domain wall motion
The MO-SLMs developed so far have large initial magnetic domain, so the light modulation area is small, making it impossible to create devices with a pixel size of less than 1 x 4 μm2. This time, we prototyped and evaluated a magnetic thin wire optical modulator with a different notch structure and hard magnet (HM). The HM film thickness was [Co(0.3nm)/Pd(0.6nm)]×14 layers, and a notch size was 30~50nm×300nm, we achieved a reduction in the initial domain size by confining the initial domain within the notch. This enabled the light modulation area to be doubled, giving the prospect of realizing fine pixels 1×2μm2.