Presentation Information
[25a-P05-4]Fabrication of high-quality (τeff > 10 ms) TOPCon structure by using sputtering and ion implantation
〇(D)Noboru Yamaguchi1,2, Shasha Li1, Shinsuke Miyajima1 (1.Tokyo Tech, 2.ULVAC)
Keywords:
TOPCon,sputtering,ion implantation