Presentation Information
[25a-P05-6]Reactive force-field molecular dynamics analysis of silicon nanocrystal formation process in silicon oxide films
〇Genta Tamura1,2, Naoya Uene2, Kazuhiro Gotoh3,4,5, Noritaka Usami5, Takashi Tokumasu2 (1.Graduate School of Eng., Tohoku Univ., 2.Inst. of Fluid Science, Tohoku Univ., 3.School of Eng., Niigata Univ., 4.IRCNT, Niigata Univ., 5.Graduate School of Eng., Nagoya Univ.)
Keywords:
Molecular dynamics,Silicon oxide