Presentation Information
[25p-12M-2]Appearance Potential Spectroscopy by Measuring Soft X-ray Yield
〇Takayuki Kashiwakura1 (1.Utsunomiya Univ.)
Keywords:
appearance potential spectroscopy,bulk sensitive,chemical state analysis
In soft x-ray appearance potential spectroscopy (SXAPS), one measures x-ray fluorescence yield from a sample, induced by electron bombardment of the surface. A spectrum similar to XANES can be obtained by sweeping the relative potential of the sample. We will report on the development of an APS apparatus that measures soft x-ray yield using a proportional counter, and the results of APS measurements of the M4,5 absorption edges of rare earth elements and the L2,3 absorption edges of 3d transition metals. Oxide powders were used for the APS measurements. By measuring x-ray yield without passing through a spectrometer, it is possible to measure APS for elements with relatively small stoichiometric ratios. The mechanism of contamination layer deposition and its influence on APS measurements are discussed.