Presentation Information

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[25p-12M-3]Characteristics of XUV-induced hydrogen radicals and its practicability towards tin contamination cleaning

〇Nozomi Tanaka¹, Baojun Zhu¹, Chang Liu^1,2, Yubo Wang¹, Katsunobu Nishihara^1,3, James Edward Hernandez¹, Tomoyuki Johzaki^1,4, Atsushi Sunahara^1,5, Kyung Sik Kang⁶, Shinji Ueyama⁷, Shinsuke Fujioka¹ (1.ILE, Osaka Univ., 2.QST, 3.Osaka Metropolitan Univ., 4.Hiroshima Univ., 5.Purdue Univ., 6.Samsung MR, 7.DSRJ)

Keywords:

Extreme ultraviolet (EUV) lithography,Photoionized and photo-dissociated plasma,Tin contamination cleaning

We have investigated characteristics of hydrogen radicals, i.e. hydrogen atoms, in photoionized and Photo-dissociated hydrogen plasma induced by intense pulsed extreme ultraviolet emission. The absolute density of hydrogen radical was measured by laser induced fluorescence diagnostics method together with theoretical modeling. We have concluded that the hydrogen plasma is in quasi-steady state and could be discribed with collisional radiative equilibrium model. The practicability of the hydrogen radicals for tin contamination cleaning of the surface of collector mirror in extreme ultraviolet lithography source was discussed, and perspectives for optimizaion will be presented.

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