Presentation Information
[10a-N201-5]Improvement of Quality and Thermoelectric Properties of Epitaxial Mg3Bi2 Thin Films by a-Si Capping
〇(DC)Akito Ayukawa1, Takeru Kuriyama1, Koki Nejo1, Wakaba Yamamoto2, Akira Yasuhara2, Haruhiko Udono1, Shunya Sakane1 (1.Ibaraki Univ., 2.JEOL Ltd.)
Keywords:
Thermoelectric materials,Mg3Bi2,Epitaxial growth
Thin-film thermoelectric materials are expected to be applied to IoT devices because they are small and lightweight independent power sources. Among them, Mg3Bi2-based materials show excellent thermoelectric performance near room temperature. However, they are very unstable under atmospheric conditions and have been reported to adversely affect thermoelectric performance.
In this study, epitaxial Mg3Bi2 thin films with a-Si capping were prepared to provide atmospheric stability, and their thermoelectric properties were evaluated.
In this study, epitaxial Mg3Bi2 thin films with a-Si capping were prepared to provide atmospheric stability, and their thermoelectric properties were evaluated.