[10a-N204-1~10] 9.3 Nanoelectronics

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[10a-N204-5] Nanogap fabrication using nano-prestructures by electromigration method during metal deposition

〇Shumpei Funada¹, Hisashi Shima², Hiroyuki Akinaga², Hiroshi Suga¹, Yasuhisa Naitoh² (1.Chiba Tech, 2.AIST)

Keywords:

nanogap electrode