[10a-N403-1~10] 7.1 X-ray technologies

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[10a-N403-4] Measurement of Space and Time Resolved Radiance Spectra of Tin Plasma for EUV Light Source

〇(M2)Itsuki Shinoda¹, Kentaro Tomita¹ (1.Hokkaido Univ.)

Keywords:

EUV,lithography,plasma

We examine the relationship between unknown plasma internal details and the nature of its emission based on the results of combined measurements of time- and spatially-resolved emission spectra and electron temperature and density using proprietary technology for tin plasma, which is used as a state-of-the-art semiconductor EUV exposure light source.