[10a-N403-1~10] 7.1 X-ray technologies

10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[10a-N403-5] Schwarzschild Objective for Interference Microscopy in Soft-X-Ray Region (2)

〇(M1)Yuta Fujisawa¹, Tetsuya KUREMATSU¹, Masahiko ISHINO², Mitsunori TOYODA¹ (1.Tokyo Polytechnic Univ., 2.QST)

Keywords:

Mo/Si multilayer mirror,period length control,Extreme Ultraviolet (EUV)

We report on the development of a Schwarzschild objective that provides diffraction-limited imaging at an operating wavelength of 13.9 nm for use in interference microscopy in the Soft-X-Ray region. We designed the period length distribution of optical systems and multilayer mirrors that achieve high reflectance. We fabricated several samples using magnetron sputtering equipment, and deposited films based on the evaluation of the samples, and achieved an error of 0.9% or less with respect to the designed value of the period length distribution near the normalized radial coordinate of +0.9 (normalized radius 25 mm) for concave mirror substrates. (normalized radius of 25 mm) of a concave mirror substrate.