[7a-N202-1~11] 6.4 Thin films and New materials

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[7a-N202-5] Study on current component analysis at Ti_0.3Zn_0.7O_1.3/Si interface for tunnel FETs

〇(M2)Kenta Ogawa^1,2, Toyohiro Chikyow², Atsushi Ogura^1,3, Takahiro Nagata^2,1 (1.Meiji Univ., 2.NIMS, 3.MREL)

Keywords:

Tunnel FETs,Oxide semiconductor,Thin film material evaluation