Presentation Information
[7p-P08-8]Development of block polymers that form fine lamellar structures
〇RYOTA ABE1, Yuji Mizobe1 (1.Mitsui Chemicals, Inc.)
Keywords:
Self-Assembly,Lithography,Patterning Technology
Directed Self-Assembly (DSA) has garnered significant attention as a next-generation lithography technique due to its capability for high-precision patterning at the molecular scale. In this study, the authors demonstrate that a novel block copolymer composed of polyolefin and poly(methyl methacrylate) can form a lamellar structure with a half-pitch of 6.5 nm through DSA. The presentation will also explore the relationship between the molecular architecture of the polymer and its self-assembly behavior.