[7p-S103-1~11] Atomic Layer Process (ALP) analysis and application technologies (2)

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[7p-S103-1] Atomic layer deposition on self-assembled monolayers for designing metal oxide nanostructures

〇(D)Takeshi Ono¹, Takuro Hosomi¹, Hikaru Saito², Hiroshi Masai³, Midori Ikeuchi², Jiangyang Liu¹, Wataru Tanaka¹, Tsunaki Takahashi¹, Jun Terao³, Takeshi Yanagida^1,2 (1.Grad. school of Eng., The Univ. of Tokyo, 2.IMCE, Kyushu Univ., 3.Grad. school of Arts and Sci., The Univ. of Tokyo)

Keywords:

atomic layer deposition,self-assembled monolayer,fluorescence

Molecular-templated atomic layer deposition (ALD), which performs ALD in the presence of organic molecules, is a method for fabricating metal oxide nanostructures with cavities that reflect the structures of the molecular templates. Molecular-templated ALD is promising in various research fields, including catalysis and sensing. This is because well-controlled cavities can achieve molecular selectivity. However, harsh ALD processes impair precisely controlled cavities due to desorption from the surface, decomposition, or aggregation of template molecules. Here, we performed ALD on chemically stable self-assembled monolayers (SAMs). We design mixed SAMs with two terminuses: one is the ALD-reactive hydroxy groups, and the other is the pyrene structures, which act as molecular templates and fluorescent probes. Mixed SAMs successfully prevent desorption during the ALD process and maintain unimolecular dispersion of pyrene templates.