[7p-S103-1~11] Atomic Layer Process (ALP) analysis and application technologies (2)

3:45 PM - 4:15 PM JST(6:45 AM - 7:15 AM UTC)

[7p-S103-7] Surface modification using cluster beams and their application in atomic layer processes

〇Noriaki Toyoda¹, Masaya Takeuchi¹ (1.Univ. of Hyogo)

Keywords:

etching,gas cluster beam,atomic layer