[8p-N106-1~11] 3.4 Laser system and materials

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

[8p-N106-3] 70-W Hybrid ArF Laser for Material Processing

〇Rikuo Koike¹, Igarashi Hironori¹, Moriai Yasuaki¹, Kamba Yasuhiro¹, Fuchimukai Atsushi¹, Miura Taisuke¹ (1.Gigaphoton)

Keywords:

Eximer laser,DUV,Laser processing

We demonstrate the 70W Hybrid ArF Laser with the pulse width of 10ns, consisting of a deep ultraviolet solid-state laser and an ArF excimer laser for semiconductor lithography. Using a high beam quality solid-state laser as a seed source, the M2 was reduced from 59 (in case of ArF laser for lithography) to 7.1, corresponding to more than 8 times improvement in focus ability. In addition, by controlling the pulse shape of the solid-state laser, we generate a burst-pulse, containing four 0.7ns pulses with the pulse separation of 3ns. The amplified output power of the burst-pulse mode was achieved to 45W.