[8p-N202-1~18] 3.13 Silicon photonics, Photonics-electronics convergence, Optical control

5:45 PM - 6:00 PM JST(8:45 AM - 9:00 AM UTC)

[8p-N202-17] NIL process using resist master mold fabricated by grayscale lithography

〇Shu Nagamatsu¹, Towa Maekawa¹, Lixin Xiang¹, Jooyeon Lee², Kensuke Otsuka², Hiroshi Miyao², Kenji Iida², Tomohiro Amemiya¹ (1.Science Tokyo, 2.Mitsui Chemicals)

Keywords:

NIL,grayscale

Nanoimprint lithography (NIL) is attracting attention as a technology for efficiently producing three-dimensional structures used in AR glasses and other applications. In this study, to reduce the time and cost required for high-quality master molds used in the NIL process, we directly fabricated three-dimensional master molds from photopolymers using grayscale exposure, and applied these to the nanoimprint process to transfer three-dimensional nanostructures onto glass substrates using high-refractive-index resist.