[8p-N403-1~15] CS.1 Code-sharing Session of 2.3&7.4

1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[8p-N403-2] emperature dependence of etching effects using Reactive GCIB Irradiation

〇(M2)Taichi Ito¹, Seiya Kitanaka¹, Masaya Takeuchi¹, Noriaki Toyoda¹ (1.University of Hyogo)

Keywords:

gas cluster ion beam,cryo etching