Presentation Information
[8p-P01-26]Improvement of pn Junction Forming Accuracy by Mask Fabrication Using a Cutting Machine
〇(B)Nana Kobayashi1, Katsuki Watabe1, Shinnosuke Idogawa1 (1.NIT, Kushiro College)
Keywords:
Mask Fabrication,pn junction,Spin on glass
This study objective is improvement pn junction alignment accuracy and integration density in semiconductor devices by using a cutting machine to fabricate custom masks. Kapton tape masks were patterned and transferred onto Si substrates using a custom jig, followed by impurity diffusion via the Spin-On Glass (SOG) method. Results demonstrated that improved mask alignment enables the realization of compact and high-density pn junctions at low cost, contributing to safer and more accessible device fabrication in educational settings.