Presentation Information
[8p-P09-6]Copper thin film growth by mist CVD: Structural control and surface roughness reduction
〇(M2)Tatsuki Okada1, Ryousuke Ohashi1, Kei Mizumoto1, Htet Su WAI1, Mondal Abhay Kumar1, Toshiyuki Kawaharamura1,2 (1.Kochi Univ. Technology, 2.Res.Inst)
Keywords:
copper,mistCVD