[9a-N324-1~4] 8.3 Plasma nanotechnology

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[9a-N324-1] Mass spectrometry of ammonia borane contained Ar plasma for h-BN film formation

〇Takeshi Kitajima¹, Yoshiaki Shobara¹, Toshiki Nakano¹ (1.Nat. Def. Acad.)

Keywords:

plasma,2D materials,dielectric films

Optimization of plasma PVD of ammonia borane as a BN source in the deposition process of h-BN, which is important in two-dimensional electronics, is necessary. Mass spectrometry was performed on the active species generated from ammonia borane powder irradiated with Ar plasma using gas pressure as a parameter, and a strong density correlation between H and BNH5 was confirmed.