[9a-N401-1~11] CS.9 Code-sharing session of 6.5&7.5

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[9a-N401-3] Reactivity of monolayer h-BN on Ni(111) with CO and H₂O

〇Masaaki Ando¹, Giovanni Carraro², Letizia Savio², Gianangelo Bracco^2,3,5, Mario Rocca^2,3, Michio Okada^1,4, Luca Vattuone^2,3,5 (1.U. Osaka, 2.IMEM-CNR Genoa Unit, 3.DIFI University of Genoa, 4.U. Osaka IRS, 5.INAF Genoa Unit)

Keywords:

Hexagonal boron nitride,Monolayer film,X-ray photoelectron spectroscopy

Monolayer films are of interest both as protective coatings of metals against oxidation as well as 2D catalysts. Hexagonal boron nitride (h-BN) is one of such films exhibiting graphene-like structure but having larger thermal stability. h-BN was produced on Ni(111) and the adsorption of H₂O and CO at room temperature and -140℃ was investigated. According to the results, in presence of pre-adsorbed oxygen or h-BN defects, water exposure at -140℃ leads to formation of oxygen species (possibly hydroxyls and boron oxide) which are stable up to at least 700 °C.