[9p-N103-1~12] Advances in Soft X-ray Multilayer Optics for Short-Wavelength Beyond EUV Lithography

5:20 PM - 5:35 PM JST(8:20 AM - 8:35 AM UTC)

[9p-N103-11] Optical Constant of Boron Material for Beyond EUV Lithography Multilayer

〇(M1C)Tomoya Tanagi¹, Naoki Hayase¹, Shinji Yamakawa¹, Tetsuo Harada¹ (1.Hyogo Univ.)

Keywords:

BEUV