The 86th JSAP Autumn Meeting 2025
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Session Details

Symposium (Oral)Symposium : Advances in Soft X-ray Multilayer Optics for Short-Wavelength Beyond EUV Lithography

[9p-N103-1~12]Advances in Soft X-ray Multilayer Optics for Short-Wavelength Beyond EUV Lithography

Tue. Sep 9, 2025 1:30 PM - 5:50 PM JST
Tue. Sep 9, 2025 4:30 AM - 8:50 AM UTC
N103 (Lecture Hall North)
1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[9p-N103-1]EUV Lithography and Multilayer for X-ray

〇Hiroo Kinoshita1 (1.University of Hyogo)
2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)English Presentation

[9p-N103-2]Recent Advance in Development of Efficient and Stable Cr/Sc-based Multilayer Mirrors for Applications in the Water Window Soft X-ray Range

〇Evgueni Meltchakov1, Franck Delmotte1 (1.Univ. Paris-Saclay)
2:30 PM - 3:00 PM JST(5:30 AM - 6:00 AM UTC)

[9p-N103-3]Development of BEUV Multilayer Mirrors Using Ion Sputtering with Quantum Ellipsometry Enabled Precise Thickness Control

〇Takeo Ejima1,2 (1.SRIS, Tohoku Univ., 2.IMRAM, Tohoku Univ.)
3:10 PM - 3:40 PM JST(6:10 AM - 6:40 AM UTC)

[9p-N103-4]NTT-AT’s development of EUV/X-ray Multilayer

〇Satoshi Ichimaru1, Masatoshi Hatayama1 (1.NTT-AT)
3:40 PM - 3:55 PM JST(6:40 AM - 6:55 AM UTC)

[9p-N103-5]Efficient laser-produced plasma extreme ultraviolet (EUV) source

〇Takeshi Higashiguchi1 (1.Utsunomiya Univ.)
3:55 PM - 4:10 PM JST(6:55 AM - 7:10 AM UTC)

[9p-N103-6]Characteristics of laser-produced beyond EUV and water-window soft x-ray sources

〇Takeshi Higashiguchi1 (1.Utsunomiya Univ.)
4:10 PM - 4:25 PM JST(7:10 AM - 7:25 AM UTC)

[9p-N103-7]Development of narrowband EUV light source by a liquid Lithium sheet target

〇Yoshiyuki Honda1, Fumio Iwamoto1, Shinji Nagai1, Shunya Yamamoto2, Shintaro Hayasaka2, Hayato Yazawa2, Tsukasa Sugiura2, Tatsuya Soramoto2, Noriyosu Hayashizaki3, Masahiro Namekawa4, Hiroyuki Sakuyama4, Takeshi Higashiguchi2 (1.Gigaphoton Inc., 2.Utsunomiya Univ., 3.Institute of Science Tokyo, 4.Sukegawa Electric Co., LTD.)
4:35 PM - 4:50 PM JST(7:35 AM - 7:50 AM UTC)English Presentation

[9p-N103-8]Effect of Thickness graded Mo/Si multilayer Mirror on Pupil Transmission Uniformity of EUV Lithography Optics

〇(PC)Maidul Haque Sekh1, Shun Uji1, Mitsunori Toyoda1 (1.Tokyo Polytechnic University, Atsugi, Japan)
4:50 PM - 5:05 PM JST(7:50 AM - 8:05 AM UTC)

[9p-N103-9]Grazing-Incidence Multilayer Mirrors for Imaging Objective in 400 eV Region

Shuntaro Waki1, Tetsuo Harada2, 〇Mitsunori Toyoda1 (1.Tokyo Polytechnic Univ., 2.Univ. of Hyogo)
5:05 PM - 5:20 PM JST(8:05 AM - 8:20 AM UTC)

[9p-N103-10]Beyond EUV Measurement Tools at NewSUBARU Synchrotron Light Facility

〇Tetsuo Harada1, Tomoya Tanagi1, Naoki Hayase1, Shinji Yamakawa1 (1.Univ. of Hyogo)
5:20 PM - 5:35 PM JST(8:20 AM - 8:35 AM UTC)

[9p-N103-11]Optical Constant of Boron Material for Beyond EUV Lithography Multilayer

〇(M1C)Tomoya Tanagi1, Naoki Hayase1, Shinji Yamakawa1, Tetsuo Harada1 (1.Hyogo Univ.)
5:35 PM - 5:50 PM JST(8:35 AM - 8:50 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[9p-N103-12]Mo-based multilayer simulation for beyond EUV lithography

〇Naoki Hayase1, Shinji Yamakawa1, Tetsuo Harada1 (1.LASTI, Univ. Hyogo)
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