[9p-N324-1~19] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[9p-N324-1] Effects of Atmospheric Pressure Low Temperature Air Plasma-Assisted Annealing
on Zinc Oxide Nanoparticles

〇Naoya Takagi¹, Kawakami Retsuo¹, Yanagiya Shin-ichiro^1,2, Nakano Yoshitaka³, Niibe Masahito⁴ (1.Tokushima Univ, 2.pLED, Tokushima Univ., 3.Chubu Univ, 4.The Univ. of Tokyo)

Keywords:

Air Plasma-Assisted Annealing,zinc oxide nanoparticle,photocatalyst

Zinc oxide (ZnO) nanoparticles, valued for their antibacterial properties, are gaining attention as photocatalysts for degrading organic pollutants, yet their activity is hindered by the high recombination rate of photo-generated carriers. While atmospheric-pressure, low-temperature O2 plasma-assisted annealing (PAA) has been reported to enhance the photocatalytic activity of TiO2 nanoparticles, its effect on ZnO remains unexplored. This study shows that PAA using ambient air as the process gas can successfully improve the photocatalytic performance of ZnO nanoparticles.