Presentation Information
[9p-N401-5]Formation of Single-Crystalline NiSi2-On-Insulator Through Rapid Thermal Annealing of Ultrathin a-Si/Ni/SOI Stacked Structures
〇Yuki Imai1, Shun Tanida1, Yuji Yamamoto2,1, Noriyuki Taoka3, Katsunori Makihara1,2 (1.Nagoya Univ., 2.IHP, 3.Aichi Inst. Tech.)
Keywords:
silicide,single-crystalline,SOI