Presentation Information
[9p-P09-11]Analysis of ionization ratio of sputtered Ti particles in deep oscillation magnetron sputtering plasma using optical emission spectroscopy
〇Eisuke Yokoyama1,2, Yuki Nakagawa2, Hiroki Kobayashi2, Nobuo Nishimiya2, Masaomi Sanekata2, Masahide Tona3, Hiroaki Yamamoto3, Keizo Tsukamoto3, Kiyokazu Fuke4, Keijiro Ohshimo5, Fuminori Misaizu6 (1.Salesian Polytech., 2.Tokyo Polytech. Univ., 3.Ayabo Corp., 4.Kobe Univ., 5.Hokkaido Univ. of Edu., 6.Tohoku Univ.)
Keywords:
deep oscillation magnetron sputtering,optical emission spectroscopy,gas rarefaction phenomenon
Deep oscillation magnetron sputtering (DOMS), which consists of a very short on/off power pulse train of a few microseconds, has both a high deposition rate and arc-free characteristics. The effect of gas density fluctuations caused by DOMS pulse injection for deposition has not been investigated. In this study, control pulses for DOMS were designed with various combinations of on/off times. The discharge current and voltage characteristics and the optical emission spectroscopy of the generated plasma were analyzed. In our previous report, we investigated the gas density distribution by analyzing the delay time, which is the time difference between the application of voltage and optical emission. The ionization ratio was calculated from the emission intensity ratio of sputtered Ti particles and ionized Ti. The correlation between the change in ionization ratio in response to the DOMS pulse and the gas density distribution was investigated.