Presentation Information
[9p-P15-1]Characterization of high reflectance multilayer films deposited by plasma ALD method.
〇KOICHI MORI1, KOZUE TANAKA1, HIRONORI TORII1 (1.JSW AFTY Co.)
Keywords:
atomic layer deposition,high reflectance multilayer films,Plasma
The optical properties and step coverage of multilayer films composed of Al2O3, Ta2O5, and TiO2 films deposited by plasma ALD were evaluated.The films exhibited excellent step coverage with minimal thickness variation between the top, side, and bottom layers.The reflectance of the (Al2O3/TiO2) - 8 pairs at film deposition temperatures of 200°C and 300°C were 99.8% and 98.8%, respectively, showing a noticeable difference.Crystalline grains were observed on the surface of the TiO2 film deposited at 300°C, indicating a rough surface morphology.These crystalline grains are believed to cause scattering at the multilayer film interface, leading to a decrease in reflectance.