Presentation Information

[10a-A23-11]Insertion Effects of InGaAs Metamorphic Buffer on 1.3-µm Range Type-II Quantum Wells on GaAs Substrate

〇Ryota Imoto1, Takeshi Fujisawa2, Hidetoshi Suzuki1, Hirosumi Yokoyama1, Koji Maeda1, Masakazu Arai1 (1.Miyazaki Univ., 2.Hosei Univ.)

Keywords:

semiconductor

We conducted experimental studies based on the hypothesis that combining a metamorphic InGaAs buffer with a Type-II material could overcome the limitation on the number of wells caused by lattice strain, which is a problem on GaAs substrates. We confirmed an increase in photoluminescence (PL) intensity from the quantum wells around 1.3 µm following the introduction of the InGaAs buffer.