[10a-F211-1~8] 13.3 Insulator technology

10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[10a-F211-6] Low Temperature Oxidation of Si(100)substrate Using Sulfuric Acid

〇Shouhei Onizuka¹, Ueno Tomo¹, Iwazaki Yoshitaka¹ (1.Tokyo Univ of Agri&Tech)

Keywords:

solution oxidation method