Presentation Information
[10a-PB4-3]Fabrication of near-infrared image sensors using Ge epitaxial layer on Si
〇Keisuke Hatasa1, Yuki Yoshino1, Ryoya Ogura1, Jose A. Piedra-Lorenzana1, Yoshiko Noda1, Daisuke Akai1, Takeshi Hizawa1, Yasuhiko Ishikawa1 (1.Toyohashi Univ. Tech.)
Keywords:
Germanium,Image sensor,Silicon