Presentation Information
[10p-C309-1]Control of lattice strain in Ge wire structures on Si using AlN tunable stressor
〇Soki Matsushita1, Jose A. Piedra-Lorenzana1, Takeshi Hizawa1, Yasuhiko Ishikawa1 (1.Toyohashi Univ. Tech.)
Keywords:
Germanium epitaxial layer,Lattice strain,Aluminum Nitride
