Presentation Information

[10p-C309-2]Trench-Filling Ge Layers on Si for Surface-Illuminated Photodetectors

〇So Nozaki1, Jose A. Piedra-Lorenzana1, Daisuke Akai1, Takeshi Hizawa1, Yasuhiko Ishikawa1 (1.Toyohashi Univ. Tech)

Keywords:

Germanium epitaxal layer,trench-filling growth,near-infrared photodetector