[10p-E206-1~10] 16.3 Bulk, thin-film and other silicon-based solar cells

3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)

[10p-E206-6] Effect of Film Thickness Reduction on Passivation Properties of Cat-CVD SiOxNy Films

〇Yinuo Song¹, Kensaku Maeda¹, Keisuke Ohdaira¹ (1.JAIST)

Keywords:

Silicon oxynitride,Surface passivation,Cat-CVD