[10p-E206-1~10] 16.3 Bulk, thin-film and other silicon-based solar cells | The 87th JSAP Autumn Meeting 2026

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Oral presentation16 Amorphous and Microcrystalline Materials : 16.3 Bulk, thin-film and other silicon-based solar cells

[10p-E206-1~10]16.3 Bulk, thin-film and other silicon-based solar cells

Thu. Sep 10, 2026 1:30 PM - 4:15 PM JST
Thu. Sep 10, 2026 4:30 AM - 7:15 AM UTC

E206 (First Year Education Bld. E Block)

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10p-E206-1]Study on Textural Forms of Bottom Silicon Surface for Perovskite/Si Tandem Photovoltaics

〇(M2)Yukito Soejima¹, Ryotaro Shimma¹, Genki Sugiura², Hyunju Lee³, Yoshio Ohshita², Atsushi Ogura^1,3 (1.Meiji Univ., 2.Toyota Tech Inst., 3.Meiji Renewable Energy Laboratory)

1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[10p-E206-2]Research on Interlayer Transparent Conductive Thin-Film Materials for Improving the Efficiency of Perovskite/Silicon Tandem Solar Cells

〇Yoshio Ohshita¹, Hyunjyu Lee³, Masahiro Okada¹, Genki Sugiura¹, Palanisamy Baskaran¹, Atushi Ogura^2,3 (1.TTI, 2.Meiji Univ., 3.Meiji MREL)

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10p-E206-3]Effect of ITO Sputter Deposition Temperature on PEDOT:PSS/Si Solar Cells

〇(M1)Shuto Atomi¹, Takumi Murata¹, Shinya Kato¹ (1.Nagoya tech univ)

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10p-E206-4]Evaluation of Ti-doped SnO₂ Thin Film Deposited by RF Magnetron Co-Sputtering

〇Tatsumi Nakamura¹, Yuta Shinohara¹, Genki Sugiura³, Hyunju Lee^2,3, Yoshio Ohshita³, Atsushi Ogura^1,2 (1.School of Sci. & Tech., Meiji Univ, 2.MREL, 3.Toyota Tech. Inst)

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10p-E206-5]Characterization of ICO Thin Films Deposited by RF Magnetron Co-Sputtering

〇Yuta Shinohara¹, Ryosuke Sugaya¹, Tatsumi Nakamura¹, Hyunju Lee^2,3, Yoshio Ohshita³, Atsushi Ogura^1,2 (1.Meiji Univ., 2.MREL., 3.Toyota Tech. Inst.)

3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)

[10p-E206-6]Effect of Film Thickness Reduction on Passivation Properties of Cat-CVD SiOxNy Films

〇Yinuo Song¹, Kensaku Maeda¹, Keisuke Ohdaira¹ (1.JAIST)

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)English Presentation

[10p-E206-7]Factors Affecting the Passivation Performance of Non-Stoichiometric Cat-CVD SiNx Films

〇Yuehong Shan¹, Kensaku Maeda¹, Keisuke Ohdaira¹ (1.JAIST)

3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[10p-E206-8]Comparison of Hydrogenation for the Passivation of TOPCon Structures: Hydrogen Radical Treatment in a Cat-CVD Chamber versus Sacrificial SiN_x:H Treatment

〇DUANYI YIN¹, Kensaku Maeda¹, Keisuke Ohdaira¹ (1.JAIST)

3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[10p-E206-9]Effect of structural properties of nc-Si/SiO_x composite filmson the passivation effect after annealing

〇Kaori Takagi¹, Yasuyoshi Kurokawa^2,4,5, Atsushi Masuda^1,3, Noritaka Usami^4,5,6, Kazuhiro Gotoh^1,3 (1.Grad. Sch. Sci. Technol., Niigata Univ., 2.Grad. Sch. Sci. & Engr., Kansai Univ., 3.IRCNT, Niigata Univ., 4.Grad. Sch. Engr., Nagoya Univ., 5.InFuS, Nagoya Univ., 6.IMaSS, Nagoya Univ.)

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[10p-E206-10]The Study of Hydrogen and Boron Introduction in Hall Contacts Using Silicon Nano-crystals/Silicon Oxide Composite Layer

〇(D)Hiroto Yamaguchi^1,2, Yasuyoshi Kurokawa^1,3, Noritaka Usami^1,2,4 (1.Grad Eng., Nagoya Univ., 2.InFuS, Nagoya Univ., 3.Grad. Sch. Sci. & Eng., Kansai Univ., 4.IMaSS, Nagoya Univ.)

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