[10p-E215-1~15] CS.10 Code-sharing session of 6.5&7.5

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[10p-E215-10] Dependence of Sn debris deposition morphology on material and temperature for EUV light sources

〇Takayuki Suzuki¹, Yoshiyuki Honda¹, Daiki Yokota^2,3, Shinji Nagai¹, Yuki Hirata³ (1.Gigaphoton Inc., 2.Tottori Univ., 3.Science Tokyo)

Keywords:

EUV light source,Sn debris,deposition morphology

In Sn-LPP EUV light sources, deposition of Sn debris on the chamber inner walls can obstruct the optical path and block exhaust channels, potentially causing system shutdown. Therefore, suppression of debris growth is important. In this study, to optimize chamber wall materials and temperature conditions, Sn was deposited on sample substrates by magnetron sputtering, and the morphology was evaluated. The results showed that the deposited structure changed to a dense morphology at a substrate temperature of 200 °C.