Session Details

[10p-E215-1~15]CS.10 Code-sharing session of 6.5&7.5

Thu. Sep 10, 2026 1:30 PM - 5:45 PM JST
Thu. Sep 10, 2026 4:30 AM - 8:45 AM UTC
E215 (First Year Education Bld. E Block)

[10p-E215-1][Invited Talk] Enhanced Low-Temperature Crystallization of Hf0.5Zr0.5O2 Thin Films through H2O2 Oxidation and Exposure Control in ALD

〇Haoming Che1, Takashi Onaya1,2, Atsushi Tamura1, Masaki Ishii3, Hiroshi Taka3, Koji Kita1 (1.Dept. of Adv. Mater. Sci., The Univ. of Tokyo, 2.NIMS, 3.Nippon Sanso)

[10p-E215-2]Characteristics and Cut Orientation Dependence of DLC-Coated QCM Sensors for Atomic Hydrogen Detection

〇Akira Heya1, Seita Niihara1, Ippei Tanaka1, Koji Sumitomo1 (1.Univ. of Hyogo)

[10p-E215-3]Evaluation of Raman Spectra of DLC Grown by PAPECVD: Dependence of CH4 Concentration

〇Satoshi Seki1, Kazuki Kanasaka1, Yulin Yan1, Yuki Okabe1, Shuichi Ogawa1 (1.Nihon Univ)

[10p-E215-4]Nitrogen Bonding States in Nitrogen-Doped DLC: Discharge Mode Dependence

〇Yulin Yan1, Satoshi Seki1, Yasutaka Tsuda2, Akitaka Yoshigoe2, Shuichi Ogawa1 (1.Nihon Univ., 2.JAEA.)

[10p-E215-5]Growth and Valence Band Structure of Carbon Films Deposited by Photoelectron-Assisted Plasma CVD at Various Substrate Temperature

〇(B)Shinnosuke Ueda1, Hidetoshi Hatsumi1, Motonobu Sato1, Mizuhisa Nihei1,2, Shuichi Ogawa1 (1.Nihon Univ., 2.enu-labs.)

[10p-E215-7]Nonlinear oxygen pressure dependence of Si dry oxidation: Comparison between p-Si(001) and n-Si(001) surfaces

〇Yuki Okabe1, Yasutaka Tsuda2, Hengyu Wen1, Akitaka Yoshigoe2, Yuji Takakuwa3, Shuichi Ogawa1 (1.Nihon Univ., 2.JAEA, 3.Tohoku Univ)

[10p-E215-8]In-situ AFM analysis of cooling rate dependence of silicon crystal growth surface in molten metal

〇Taiga Sako1, Yuto Nishiwaki1, Takashi Ichii1 (1.Kyoto Univ.)

[10p-E215-9]Luminescence Properties of Fe-silicide Core /Si-Shell Quantum Dots Formed through a Cyclic Process Sequence

〇Eita Yano1, Yuki Imai1, Yuji Yamamoto1,2, Markus Andreas Schubert2, Katsunori Makihara1,2 (1.Nagoya Univ., 2.IHP)

[10p-E215-10]Dependence of Sn debris deposition morphology on material and temperature for EUV light sources

〇Takayuki Suzuki1, Yoshiyuki Honda1, Daiki Yokota2,3, Shinji Nagai1, Yuki Hirata3 (1.Gigaphoton Inc., 2.Tottori Univ., 3.Science Tokyo)

[10p-E215-11]Automated Analysis of Domain Distribution in CVD Graphene by Photoelectron Momentum Microscopy

Shinichiro Tanaka1, Shigemasa Suga1, Yuki Somei2, Yusuke Sato2, Fumihiko Matsui2, Itsuki Imahori3, Yoshihide Aoyagi3, 〇SHINYA OHNO3 (1.SANKEN Osaka Univ., 2.UVSOR, IMS, 3.Yokohama Nat'l Univ.)

[10p-E215-12]X-ray Photoelectron Spectroscopy study of Surfactants Adsorbed on Rutile-TiO2(110) Surface

〇Yuichi Sugizaki1, Yuji Yamashita1 (1.Kanagawa Univ.)

[10p-E215-13]Ambient-Pressure HAXPES Observation of Electronic Structure Dynamics of Anatase TiO2 Photocatalysts under Water Vapor Atmospheres

〇(M2)Keita Murase1, Hidetoshi Miyazaki1, Joji Mizuno1, Yasumasa Takagi2, Satoshi Yasuno2, Juhana Jaafar3, Naoko Yoshida4 (1.Nitech, 2.JASRI, 3.UTM, 4.Nagoya Univ.)

[10p-E215-14]Why does solar 2-photon absorption occur via isolated O vacancy states in rutile TiO2

〇Koichi Kato1, Takahiro Yamasaki2, Jun Nara3, Katsuyuki Fukutani1 (1.IIS Tokyo Univ., 2.Grad. Eng. Osaka Univ., 3.NIMS-MANA)

[10p-E215-15]Characterization of Chemical Bonding Features at the Ti/Silica Glass Interface via HAXPES

〇Yuki Imai1, Kotaro Ozaki1, Katsunori Makihara1,2 (1.Nagoya Univ., 2.IHP GmBH)